Samsung Electronics and SK hynix were considering moving up the timing of EUV equipment orders, ChosunBiz reported on November 8, 2026. The report came as ASML forecast that its planned supply of Low-NA EUV and DUV immersion systems would not fully meet customer demand in 2027 and 2028.

ASML’s forecast describes planned supply against demand across its customers; the reported order discussions concern two specific buyers.

What ASML expects from equipment supply

In its October 14, 2026, third-quarter release, ASML said customers were raising their short- and medium-term equipment demand forecasts, driven mainly by their views on the scale and duration of AI investment. The company forecast that planned supply of both Low-NA EUV and DUV immersion systems would fall short of customer demand in 2027 and 2028. ASML’s release describes an overall demand outlook, not allocations to individual buyers.

ASML had communicated plans to increase capacity for Low-NA EUV and DUV immersion by 30% in 2027. A further 30% increase for 2028 had been under investigation; in October, the company said it was examining capacity beyond that level. These are plans under investigation, not completed capacity increases.

ASML anticipated roughly 65 Low-NA EUV systems in 2026, after shipping 44 in 2025, according to its third-quarter investor call transcript. CEO Christophe Fouquet also said some customers had expressed interest in placing orders for 2029 and 2030.

For the financial results behind that outlook, see NeoTeo’s earlier coverage of ASML’s Q3 2026 results.

What Samsung and SK hynix reportedly considered

ChosunBiz reported that both companies were considering moving up EUV order timing amid long equipment lead times. The report describes deliberations, not a completed change in ordering.

ChosunBiz also reported that SK hynix had disclosed a purchase of EUV equipment worth about 11.95 trillion won, with a delivery deadline of December 31, 2027.

How the equipment fits into memory production

Extreme ultraviolet lithography uses EUV light to pattern chip layers; ChosunBiz describes it as a way to reduce the need for multiple patterning exposures. Citing TrendForce, the outlet reported that SK hynix planned to apply EUV to more than five layers of its 1c DRAM, two more layers than in the preceding generation.

ChosunBiz also reported that Samsung’s Pyeongtaek Campus Line 5, or P5, was targeted to begin operations in 2028.