A report published September 15 said ASML’s existing EUV capacity was nearly sold out through the end of 2027. It also said customers were asking ASML for more systems and faster deliveries. ASML’s official capacity outlook points to planned growth in low-NA EUV production as demand for advanced chips rises.
What ASML plans for low-NA EUV capacity
ASML put its 2026 low-NA EUV capacity at approximately 65 systems in its second-quarter results, published July 15. The company plans to increase that capacity by 30% in 2027 and is investigating a further 30% increase for 2028.
Low-NA EUV systems use extreme-ultraviolet lithography to produce patterns for advanced chips. The 2028 increase remains under investigation; ASML has not set it out as a completed production commitment.
Why AI demand matters to lithography
ASML says investment related to AI and progress in AI technologies are driving demand for advanced logic and memory chips. It also says customers are accelerating their capacity expansion plans.
Lithography systems are part of the equipment used to make chip-circuit patterns. As chipmakers expand capacity for advanced logic and memory, demand reaches the machinery used in that production chain.
